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High aspect ratio dense pattern-programmable nanostructures utilizing metal assisted chemical etching


Stanford Reference:

13-073


Abstract


SLAC researchers have discovered a method of creating arbitrarily patterned nanostructures while controlling the vertical etching direction to produce very high aspect ratio, dense features. Programmable patterns, not limited to but including linear structures, as well as curved structures can be transferred into the silicon to create a high aspect ratio silicon mold. Programmable patterns can be achieved through any top down or bottom up approach that allows a metal pattern to be produced on top of the silicon.


Figure 1: Spiral x-ray zone plate patterned by electron beam lithography, etched using metal assisted chemical etching with vertical direction control


Figure 2: SEM cross section image of 100 nm lines and spaces etched with vertical etching



Applications


  • x-ray diffractive optical elements - x-ray zone plates/holograms, imaging, nano and micro CT systems, x-ray focusing
  • Energy – thermoelectric materials, solar cells, batteries
  • Sensors for high sensitivity detection - bio, chem, gas, pressure, lab on a chip
  • NEMS devices - nano actuators for precise motion control
  • directional filtering - water purification, desalination, affinity membranes

Advantages


  • High aspect ratio (> 100:1 can be achieved) dense nanoscale features etched into silicon, compatible with curved as well as linear structures and controllable sidewall roughness (can be relatively smooth)
  • Wet etch process is cost effective for both large area and small area patterning
  • Pattern defined by the metal catalyst layer and has extremely high etch sensitivity. Therefore, as important for patterning nanoscale features, very high aspect ratio of the original pattern is not required.
  • X-ray diffractive optical elements - higher efficiency and resolution for 50 eV – 100 keV, enabling technology to develop compact x-ray measurement/imaging systems
  • Thermoelectric materials – creation of a volume structured Si material rather than a thin film
  • Sensors for high sensitivity detection - higher surface to volume ratios for increased sensitivity and signal to noise ratio, neuroprobes
  • NEMS devices - higher resonant frequencies and smaller driving power
  • Directional filtration - programmable pattern for filtering, controlled porosity

Innovators & Portfolio


  • Chieh Chang   
  • Anne Sakdinawat   

Date Released

 9/3/2013
 

Licensing Contact


Evan Elder, Licensing Associate
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Related Keywords


energy: alternative   photonics: components   photonics: holographic   imaging: CT   imaging: guidance   imaging: x-ray   13-073   
 

   

  

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