Open-air ultrasonic spray combustion deposition and rapid plasma curing of metal oxides

Researchers at Stanford have developed a next-generation technique of fabricating metal oxide thin films using open-air ultrasonic spray combustion and plasma curing. Conducting oxides (TCOs), in particular Indium tin oxide (ITO), are pivotal for manufacturing of electronic devices, photovoltaics and solar cells. However, the manufacturing techniques remain time-intensive and low-throughput for large-scale production of TCOs via traditional vacuum-based deposition (i.e., sputtering).

The scientists at Stanford developed a novel open-air and scalable TCO synthesis technique that is time-efficient, highly tunable, and environmentally friendly. The chloride-free combustion synthesis uses an open-air ultrasonic spray or other solution casting technique to deposit the coating, and then anneals rapidly to generate an amorphous or crystalline oxide depending on the curing temperature. Then, an open-air plasma is used to tune the film conductivity. This method gives high throughput, requires low temperature deposition for amorphous oxide generation, and simultaneously achieves high conductivity. This technique significantly reduces the cost of fabrication of TCO and improves the efficiency of production without sacrificing for its conductivity.

Stage of Development
Proof of Concept

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