Researchers at Stanford have developed a non-destructive method for generating and patterning optical color centers with nanoscale resolution without the need for high energy radiation. Color centers, which are optically active defects within the lattice structur
Researchers in Stanford's Nanoscale Prototyping Laboratory have developed a simple, high throughput method to fabricate ultra-thin, defect-free, single crystal silicon sheets at a competitive cost.
Stanford researchers patented a method to design, computationally optimize and fabricate efficient optical devices using semiconducting and dielectric nanostructures.
Researchers in Profs. Jonathan Fan and Jim Plummer's laboratory have patented a generalized, CMOS-compatible process to fabricate single crystal metal components on amorphous insulator substrates.
Stanford researchers at the Cui Lab have designed a self-aligned hybrid metal-dielectric surface that offers unparalleled performance in applications where both a transparent contact and a photon management texture are needed.
Researchers in Stanford's Nanoscale Prototyping Laboratory have developed a low-temperature process for fabricating etch-resistant, pinhole-free spacer dielectrics a few nanometers thick.
Stanford University and Samsung researchers have patented a microfluidic-based platform that can rapidly fabricate and characterize Organic Thin Film Transistor (OTFT) arrays composed of solution-processable organic semiconducting polymers.
Stanford researchers have developed an elastomer polymer dielectric for high performance transistors with both high gain and high transconductance, which also shows unprecedented high bias-stress stability in air and water.
Stanford researchers have patented a low cost, textured crystalline silicon (c-Si) photovoltaic film fabricated via scalable, ion beam assisted deposition (IBAD) on display glass.