Stanford researchers have patented a fabrication process for monolithic integration of different epitaxial materials on the same substrate for improved coupling of optoelectronic devices.
Stanford researchers patented a method to design, computationally optimize and fabricate efficient optical devices using semiconducting and dielectric nanostructures.
Researchers in Profs. Jonathan Fan and Jim Plummer's laboratory have patented a generalized, CMOS-compatible process to fabricate single crystal metal components on amorphous insulator substrates.
Stanford researchers at the Cui Lab have designed a self-aligned hybrid metal-dielectric surface that offers unparalleled performance in applications where both a transparent contact and a photon management texture are needed.
Researchers in Stanford's Nanoscale Prototyping Laboratory have developed a low-temperature process for fabricating etch-resistant, pinhole-free spacer dielectrics a few nanometers thick.
Stanford University and Samsung researchers have patented a microfluidic-based platform that can rapidly fabricate and characterize Organic Thin Film Transistor (OTFT) arrays composed of solution-processable organic semiconducting polymers.
Stanford researchers have developed an elastomer polymer dielectric for high performance transistors with both high gain and high transconductance, which also shows unprecedented high bias-stress stability in air and water.
Stanford researchers have patented a low cost, textured crystalline silicon (c-Si) photovoltaic film fabricated via scalable, ion beam assisted deposition (IBAD) on display glass.