Researchers at Stanford have developed a next-generation technique of fabricating metal oxide thin films using open-air ultrasonic spray combustion and plasma curing.
Researchers in Stanford's Nanoscale Prototyping Laboratory have developed a low-temperature process for fabricating etch-resistant, pinhole-free spacer dielectrics a few nanometers thick.
Stanford University and Samsung researchers have patented a microfluidic-based platform that can rapidly fabricate and characterize Organic Thin Film Transistor (OTFT) arrays composed of solution-processable organic semiconducting polymers.