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Docket #: S19-069

Heterogenous Integration of Diamond and GaN Transistors for Complementary Logic Operation

This invention is a set of structures and associated processes to integrate GaN with Diamond to develop a full complementary CMOS device capable of operation in high power and high temperature applications. GaN HEMTs take the advantage of its high mobility 2-dimensional electron gas (2DEG) at the interface of AlGaN/GaN, where electrons move freely in a quantum well due to the presence of polarization charge. On the other hand, diamond exhibits the highest breakdown field (10 MV/cm), the largest thermal conductivity (>20 W/cm.K) of any of the wide-bandgap materials with a bandgap of about 5.45 eV, can provide a high density 2-dimensional hole gas (2DHG) at the surface. Therefore, 2DHG from a hydrogen terminated diamond (hole-FET) can make a complementary logic with 2DEG from AlGaN/GaN HEMT.


Stage of Development

  • Created and tested films
  • These diamond films exhibit microscopic uniformity in crystal grain size, and macroscopic uniformity in thickness and interface abruptness via a process which is scalable to large wafer sizes
  • Hole-FET fabrication using single crystal and polycrystalline diamonds
  • Fabrication and high temperature characterization of a CMOS inverter including Hole-FET and HEMT
  • Applications

    • High power and high frequency
    • Complementary logic applications, particularly in high temperature and harsh environment
    • A building block in any electronics operating in high temperature and harsh environment
    • End user applications include power electronics, communications and sensors

    Advantages

    • Heterogeneous integration of diamond Hole-FET and GaN-based HEMTs is a complementary circuit which enables:
      • higher temperature operation that Si-based or other semiconductor CMOS fails
      • higher mobility holes and electrons the same time
      • extremely high-power output at high frequencies
    • Scalable to large wafer sizes

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